The semiconductor industry fabricates chipsets, wafers, and printed circuit boards. These processes require ultrapure water for cleaning, rinsing, etching, and surface conditioning. Semiconductor applications can utilize ion-selective electrode (ISE) measurements in various process controls such as monitoring sodium, calcium, and chloride to identify contamination in rinse and process water and measuring fluoride concentration after etching process.
Critical design features such as form factor, insertion, and reference junction material, enable AlpHa’s ISEs to be designed for the specific application requirement. AlpHa can assist in developing ISEs that require a high level of customization to ensure performance objectives are achieved. AlpHa’s ISE portfolio can target over twenty different ions which are designed for both lab and continuous process environments.