Municipal and industrial wastewater facilities monitor dissolved oxygen (DO) concentrations to ensure the treatment process is operating properly which includes the health and performance of the wastewater biology and efficient use of treatment chemicals and energy. Continuously monitoring DO ensures optimal oxygenation in activated sludge and biological nutrient removal (BNR) processes without inefficiently over aerating. Facilities are required to pretreat their outgoing wastewater and submit biological oxygen demand (BOD) data on a regular basis to meet regulatory or compliance requirements. AlpHa has sensor solutions uniquely tailored to each application, including continuous (process) monitoring sensors, DO and BOD laboratory electrodes, and handheld DO meter solutions.
Read MoreAP Series | HCR Series | |
Response Rate | No Overcoat: T90 ~1 sec | No Overcoat: T90 ~1 sec |
White Overcoat: T90 ~1 min | Black Overcoat: T90 ~1 min | |
Black Overcoat: T90 ~1 min | ||
Dynamic Range in Gas | 0 – 100% O2 / 0 – 760 mmHg O2 | 0 – 100% O2 / 0 – 760 mmHg O2 |
Dynamic Range in Water (DO) | 0 – 40 ppm (wt) | 0 – 40 ppm (wt) |
Dynamic Range in Other Liquids | 0 to Oxygen Saturation Level | 0 to Oxygen Saturation Level |
Resolution in Gas | 0.005% O2 / 0.04 mmHg | 0.05% O2 / 0.4 mmHg |
Resolution in Water (DO) | 0.002 ppm (wt) / 2.0 ppb (wt) | 0.02 ppm (wt) / 20 ppb (wt) |
Resolution in Other Liquids | 0.005% of Oxygen Saturation Level | 0.05% of Oxygen Saturation Level |
Accuracy | 5% of Reading | 5% of Reading |
Lowest Detectable Level (gas) | 0.005% O2 / 0.04 mmHg | 0.05% O2 / 0.4 mmHg |
Lowest Detectable Level (water) | 0.002 ppm (wt) / 2.0 ppb (wt) | 0.1 ppm (wt) / 100 ppb (wt) |
Lowest Detectable Level in Other Liquids | 0.005% of Oxygen Saturation Level | 0.25% of Oxygen Saturation Level |
Sensor Drift | 0.002 O2% per Day | 0.001 O2% per Hour |
Operating Temperature | -50 to 80°C | -50 to 120°C |
Recommended Patch Replacement | 1 Year | 1 Year |
AlpHa Measurement Solutions is a liquid test and measurement platform serving the critical needs of applications in environments requiring process control, automation, analysis, and monitoring.